Influence of Substrate Temperature on Structural and Morphological Properties of SnO2 Nanostructured thin Films
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SnO2 nanostructures thin films with thickness of 500 nm were prepared by electron beam-physical vapor deposition on glass substrate at temperature of 300, 373, 443, and 583 K. Structural and morphological properties of these nanostructured thin films were studied by Scanning and Transmission Electron Microscopy (SEM, TEM) and Atomic Force Microscope (AFM) methods. The changes in structural and morphological properties are found at different temperatures. Increase temperature causes important change of the structural and morphological properties. The sample prepared at 300 K has crystalline structure and the sample prepared at 583 K has amorphous structure. Roughness parameters have low values at 300, 373, 443 K as opposed to the values obtained at 583 K. This different behavior may be due to the amorphous structure of the sample that was observed in the TEM analysis.
- 2013 fascicula9 nr3