Influence of Technological Parameters on the Evolution of Nickel Films Deposited by Electrolysis

Abstract

The influence of technological parameters on the structure of nickel layers electrodeposited on a copper substrate in a Watts bath has been studied. The complex influence of current densities, temperature and pH values on the formation of the deposition layers are compared. The surface morphology of the nickel films was analyzed by scanning electron microscopy (SEM) and atomic force microscopy (AFM). X-ray diffraction (XRD) was used to investigate the crystallinity of the prepared samples. The increase in the current density leads to fine crystallized films, while layers obtained at even higher current density have dendritic structures. The temperature increasing results in a structure change from fine to coarse.