Arată înregistrarea sumară a articolului

dc.contributor.authorConstantinescu, Stela
dc.contributor.authorOrac, Lucica
dc.date.accessioned2018-09-03T08:49:25Z
dc.date.available2018-09-03T08:49:25Z
dc.date.issued2013
dc.identifier.issn1453 – 083X
dc.identifier.urihttp://10.11.10.50/xmlui/handle/123456789/5359
dc.descriptionThe Annals of "Dunarea de Jos" University of Galati Fascicle IX Metallurgy and Materials Science N0. 3 – 2013, ISSN 1453 – 083Xro_RO
dc.description.abstractThis paper presents the realization of TiC thin films by CVD method. The thin layers of TiC thicknesses were 8 and 10μm, their thickness increasing with time, keeping the temperature. Diffractometer analysis certifies that this thin layer of TiC is homogeneous and unscratched. Microhardness of thin layers of TiC is HV0,05 = 30000MPa compared to WC (carbide substrate of the component) that has a microhardness HV0,05 = 17000MPa.ro_RO
dc.language.isoenro_RO
dc.publisherUniversitatea "Dunărea de Jos" din Galaţiro_RO
dc.subjectmethodro_RO
dc.subjectdiffractometer analysisro_RO
dc.subjectmicrohardnessro_RO
dc.titleCharacterization of Sintered Hardmetals Coated with Ticro_RO
dc.typeArticlero_RO


Fișiere la acest articol

Thumbnail

Acest articol apare în următoarele colecții(s)

Arată înregistrarea sumară a articolului